IVth Russian Conference
PHYSICAL AND PHYSICO-CHEMICAL BASES OF ION IMPLANTATION
(with foreign scientists participation)
and International Youth Conference
RADIATION-THERMAL EFFECTS AND PROCESSES IN INORGANIC MATERIALS
23-26 October, 2012, Novosibirsk.
News
23.07.2012 The Preliminary Program is now available.
11.05.2012 Attention! The deadline for registration and abstract submission is extended to June 1, 2012.
28.02.2012 Welcome to visit our Conference site!
Contacts
Fax: +7(383)333-27-71
E-mail:
Irina V. Antonovna - Scientific Secretary of the Conference
Phone: +7(383)333-06-99
Svetlana A. Tychinskaya
Phone: +7(383)333-24-88
Address
A.V. Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences.
13 ac. Lavrentyev aven., 600090, Novosibirsk, Russia.
SCIENTIFIC TRENDS OF THE CONFERENCE

At the forthcoming Conference it is supposed to consider reports and messages on the following trends:

  • General physical and physico-chemical problems of ion implantation and radiation solid state physics, physical phenomena in electric and thermal fields.

  • Physical problems of ion implantation in semiconductors.

  • Physical problems of ion implantation in non-semiconductor materials.

  • Ion-ray formation of nanostructures, objects of spintronics and their properties.

  • Physical long-distance phenomena under ion radiation and adjacent points.

  • Physical problems of ion implantation technology and focused ion beams.

  • Application of radiation-thermal processes in nanotechnology.

  • Investigation methods of radiation-thermal modification of materials properties.

Please, fill in the registration form and take part in our Conference
List of invited reports.
Conference organizers
Reports publication in 'N.I. Lobachevsky Nizhegorodsk Newsletter' journal.
 
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