N.Cherkashin , S.Reboh, A.Lubk, P.Pochet, A.Claverie and M.J.Hÿtch
Direct
mapping of strain depth distributions with a nanometer spatial resolution in ion
implanted Si using Dark-Field Electron Holography CEMES, Université de Toulouse, Toulouse, France
CEA UJF, INAC, Lab Simulat Atomist (L_ Sim), Grenoble, France
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